Company Filing History:
Years Active: 2002-2003
Title: Qingyan Han: Innovator in Semiconductor Processing
Introduction
Qingyan Han is a notable inventor based in Columbia, MD (US), recognized for his contributions to semiconductor processing. With a total of 2 patents, he has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
One of his latest patents is the "Oxygen Free Plasma Stripping Process." This method involves stripping photoresist and removing post-etch residues from semiconductor wafers using an oxygen-free plasma. The process creates a plasma by subjecting an oxygen-free gas to an energy source, generating both electrically neutral and charged particles. The neutral particles react with the photoresist to form volatile gases, which are then removed from the wafer. The gas composition used in this process includes a hydrogen-bearing gas and a fluorine-bearing gas, with the latter being less than 10 percent by volume of the total gas composition.
Another significant patent is the "Method for Detecting an Endpoint for an Oxygen Free Plasma Process." This method determines the endpoint of the stripping process by exciting a gas composition containing nitrogen and a reactive gas to form an oxygen-free plasma. The plasma reacts with the substrate to produce emitted light signals, which are measured to determine when the photoresist and residues have been effectively removed.
Career Highlights
Qingyan Han has worked with prominent companies in the semiconductor industry, including Axcelis Technologies, Inc. and Eaton Corporation. His experience in these organizations has contributed to his expertise in developing advanced semiconductor processing techniques.
Collaborations
Throughout his career, Qingyan has collaborated with talented professionals, including Palani Sakthivel and Ricky Ruffin. These collaborations have fostered innovation and the sharing of knowledge in the field of semiconductor technology.
Conclusion
Qingyan Han's innovative work in semiconductor processing, particularly through his patents, showcases his significant contributions to the industry. His methods for stripping photoresist and detecting process endpoints are vital advancements that enhance semiconductor manufacturing efficiency.