Qinglei Wang

Title: Innovations of Qinglei Wang

Introduction

Qinglei Wang is a notable inventor based in San Jose, California. He has made significant contributions to the field of integrated circuit design, particularly in the areas of planar and finFET technology. With a total of two patents to his name, Wang's work showcases his expertise and innovative thinking.

Latest Patents

Wang's latest patents include a "Parameterized cell for planar and finFET technology design." This invention provides a parameterized cell (Pcell) that integrates planar design with fin-based design criteria, including fin pitch. The technology computes quantized values based on fin pitch for material regions in a planar design that correspond to regions in a fin design. His second patent, "Double patterning compatible colorless M1 route," discloses a method for enhancing circuit designs using colorless DPT M1 route placement. This method maintains high routing efficiency while ensuring M1 decomposability of target patterns and resulting circuits.

Career Highlights

Qinglei Wang is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work at the company has allowed him to push the boundaries of integrated circuit design and contribute to advancements in technology.

Collaborations

Wang has collaborated with notable colleagues such as Mahbub Rashed and Lei Yuan. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Qinglei Wang's contributions to the field of integrated circuit design are significant and impactful. His innovative patents reflect his expertise and commitment to advancing technology in the semiconductor industry.