Santa Clara, CA, United States of America

Qin Zhong


Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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5 patents (USPTO):

Title: Innovations of Qin Zhong in Photolithography Systems

Introduction

Qin Zhong is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of photolithography, holding a total of 5 patents. His work focuses on enhancing the precision and efficiency of lithography systems, which are crucial in semiconductor manufacturing.

Latest Patents

Qin Zhong's latest patents include innovative methods for correcting positional errors in photolithography systems. One of his patents, titled "Model based dynamic positional correction for digital lithography tools," discusses a system that collects data during a stabilization period to create a model for estimating and correcting errors in subsequent operations. Another patent, "Methods and apparatus for correcting lithography systems," outlines a method for directing light beams toward substrates and capturing images to determine necessary corrections for optimal performance.

Career Highlights

Qin Zhong is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His expertise in photolithography has positioned him as a key contributor to advancements in this technology.

Collaborations

Throughout his career, Qin Zhong has collaborated with talented individuals such as Tamer Coskun and Muhammet Poyraz. These collaborations have fostered innovation and have led to the development of cutting-edge solutions in the field.

Conclusion

Qin Zhong's contributions to photolithography systems exemplify the importance of innovation in technology. His patents and work at Applied Materials, Inc. continue to influence the semiconductor industry significantly.

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