Company Filing History:
Years Active: 2016
Title: **Qin Wang: Innovating in Semiconductor Technology**
Introduction
Qin Wang is a prominent inventor based in Ballston Spa, NY, specializing in semiconductor technologies. With a focus on methods for fabricating transistors, his work has contributed significantly to advancements in electronic devices. Throughout his career, he has been awarded two patents that showcase his innovative approaches in the field.
Latest Patents
Qin Wang's latest patents include two significant methodologies. The first patent details methods of facilitating the fabrication of transistors, which includes defining a channel region in a substrate with adjoining isolation material. The processes aim to enhance the gate structure over a gate interface area, thereby reducing the threshold voltage of the gate structure. The inventive approach also involves etching an elongate notch to further optimize the gate interface area.
The second patent focuses on developing a field-effect transistor (FET) structure for minimum size length and width devices, intended to boost performance and reduce mismatch. This patent outlines methods for preparing CMOS transistors with longer effective gate lengths, emphasizing the critical stages of forming trenches and depositing high-k dielectric layers to improve device efficiency.
Career Highlights
Qin Wang is employed at GlobalFoundries Inc., where he leverages his expertise to drive innovation in semiconductor manufacturing. His work reflects a commitment to improving transistor technology, which is essential for modern electronic applications. The advancements he has made are integral to enhancing the performance of various electronic circuits.
Collaborations
Throughout his career, Qin Wang has collaborated with esteemed colleagues including Zhaoxu Shen and Min-Hwa Chi. These collaborations have fostered a synergistic environment, promoting shared knowledge and resources to further their collective goals in semiconductor innovation.
Conclusion
Qin Wang's contributions to the field of semiconductor technology, particularly in transistor fabrication methods, highlight his innovative spirit and dedication to advancing electronic devices. With his two patents, he has laid the groundwork for future advancements in performance and efficiency in the semiconductor industry.