Company Filing History:
Years Active: 2012
Title: Innovations of Qin-Min Wang
Introduction
Qin-Min Wang is a notable inventor based in North Andover, MA (US). He has made significant contributions to the field of vapor deposition technology. His work focuses on improving the stability and volatility of precursor compositions used in thin film deposition.
Latest Patents
Qin-Min Wang holds 1 patent for his invention titled "Precursor compositions and methods." This patent describes compositions that include an amido-group-containing vapor deposition precursor and a stabilizing additive. These compositions exhibit improved thermal stability and increased volatility compared to the precursor itself. They are particularly useful in the deposition of thin films, such as through atomic layer deposition.
Career Highlights
Qin-Min Wang is associated with Rohm & Haas Electronic Materials LLC, where he applies his expertise in material science and engineering. His innovative approaches have contributed to advancements in electronic materials and deposition techniques.
Collaborations
Some of his notable coworkers include Deodatta Vinayak Shenai-Khatkhate and Stephen J Manzik. Their collaborative efforts have further enhanced the research and development initiatives within their organization.
Conclusion
Qin-Min Wang's contributions to vapor deposition technology and his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the development of new materials and techniques in electronic applications.
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