The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2012
Filed:
Mar. 03, 2008
Applicants:
Deodatta Vinayak Shenai-khatkhate, Danvers, MA (US);
Stephen J. Manzik, Hampstead, NH (US);
Qin-min Wang, North Andover, MA (US);
Inventors:
Deodatta Vinayak Shenai-Khatkhate, Danvers, MA (US);
Stephen J. Manzik, Hampstead, NH (US);
Qin-Min Wang, North Andover, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/22 (2006.01); C09D 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful in the deposition of thin films, such as by atomic layer deposition.