Qiang Wu

Title: Innovations of Qiang Wu

Introduction

Qiang Wu is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of photolithography, holding a total of 4 patents. His work focuses on improving the precision and efficiency of wafer alignment systems and error detection methods.

Latest Patents

One of Qiang Wu's latest patents is titled "Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography." This invention discloses a method for detecting phase and amplitude errors in an alternating phase shifting mask. The method involves passing a collimated light beam through adjacent, phase-shifted openings in the mask and recording the beam intensities of diffracted light. From these recorded intensities, an angle α is determined, which represents a deviation from symmetrically distributed diffraction orders. Additionally, the phase error is calculated from α, while the amplitude error is derived from the minimum and maximum intensities.

Another significant patent is the "Wafer alignment system using parallel imaging detection." This system includes a holder for the wafer, which contains alignment marks, and features both a coarse and a fine alignment system. The fine alignment system utilizes multiple optical detectors to detect corresponding alignment marks on the wafer. An alignment processor controls these detectors to simultaneously detect and process signals in parallel operations, enhancing the precision of wafer alignment.

Career Highlights

Qiang Wu is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of photolithography. His work has been instrumental in advancing technologies that are critical to semiconductor manufacturing.

Collaborations

Throughout his career, Qiang Wu has collaborated with notable colleagues, including Scott Josef Bukofsky and Bomy A Chen. These collaborations have contributed to the development of advanced technologies in his field.

Conclusion

Qiang Wu's contributions to photolithography and wafer alignment systems demonstrate his commitment to innovation and excellence in technology. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, making him a valuable asset to IBM and the industry as a whole.