Qiang Wang

Title: Qiang Wang: Innovator in Adaptive Numerical Aperture Control

Introduction

Qiang Wang is a notable inventor based in Davis, CA (US). He has made significant contributions to the field of optical engineering, particularly in the area of numerical aperture control methods. His innovative approach has led to advancements in the modeling and measurement of critical dimensions in semiconductor manufacturing.

Latest Patents

Qiang Wang holds a patent for an "Adaptive numerical aperture control method and system." This patent describes systems and methods for providing efficient modeling and measurement of critical dimensions and overlay registrations of wafers. The efficiency of the process is enhanced in both the spectral and temporal dimensions. In the spectral dimension, different numerical aperture (NA) models can be utilized for various wavelengths in electromagnetic calculations, striking a balance between computation speed and accuracy. In the temporal dimension, different NA models may be applied at different iterations or stages in the process, improving computation speed without compromising the quality of the final result. He has 1 patent to his name.

Career Highlights

Qiang Wang is currently employed at Kla Tencor Corporation, where he continues to develop innovative solutions in the field of optical engineering. His work has been instrumental in enhancing the efficiency and accuracy of wafer measurements, which are critical in semiconductor manufacturing.

Collaborations

Qiang has collaborated with notable colleagues, including Liequan Lee and Fei Li. Their combined expertise has contributed to the advancement of technologies in their field.

Conclusion

Qiang Wang's contributions to adaptive numerical aperture control have made a significant impact on the semiconductor industry. His innovative methods enhance both efficiency and accuracy in wafer measurements, showcasing his role as a leading inventor in this domain.