Qian Jiang Zhang

Title: Qian Jiang Zhang: Innovator in Semiconductor Technology

Introduction

Qian Jiang Zhang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Qian Jiang Zhang holds a patent for a semiconductor structure and its fabrication method. This patent outlines a method that includes providing a to-be-etched layer, forming an initial mask layer over it, and creating a patterned structure. The process involves exposing a portion of the initial mask layer, forming a barrier layer on the sidewall surface of the patterned structure, and performing an ion doping process to create doped and un-doped regions. The method concludes with the formation of a mask layer that includes an opening exposing the top surface of the to-be-etched layer.

Career Highlights

Throughout his career, Qian Jiang Zhang has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in Shanghai and Beijing, where he has contributed to various projects and advancements in semiconductor technology.

Collaborations

Qian Jiang Zhang has collaborated with several professionals in his field, including Bo Su and Tao Dou. These collaborations have further enhanced his work and contributions to semiconductor innovations.

Conclusion

Qian Jiang Zhang is a key figure in semiconductor technology, with a valuable patent and a career marked by significant contributions. His work continues to influence the industry and drive innovation forward.