Okemos, MI, United States of America

Qi Hua Fan

USPTO Granted Patents = 5 


 

Average Co-Inventor Count = 2.1

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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5 patents (USPTO):Explore Patents

Title: Innovations of Inventor Qi Hua Fan

Introduction

Qi Hua Fan is an accomplished inventor based in Okemos, MI (US). He holds a total of 5 patents that showcase his expertise in advanced coating technologies and plasma systems. His innovative contributions have significantly impacted the field of materials science and engineering.

Latest Patents

One of his latest patents is the "Magnetic-field-assisted plasma coating system." This invention provides a method for applying coatings using a magnetic-field-assisted plasma system. It features a cathode with a linearly moveable magnetic field and utilizes a workpiece as an anode, allowing for internal coating of a bore within the workpiece. Additionally, the system employs an elongated and hollow cathode with magnetic sources, creating a vacuum chamber defined by the workpiece itself. Another notable patent is the "Single beam plasma source," which includes an apparatus for generating plasma or ion sources. This invention allows for simultaneous excitation of an ion source using different power supplies, enhancing the efficiency and versatility of plasma generation.

Career Highlights

Qi Hua Fan has worked with prestigious institutions such as Michigan State University and Fraunhofer USA, Inc. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.

Collaborations

Throughout his career, Qi Hua Fan has collaborated with notable colleagues, including Thomas Schuelke and Martin E Toomajian. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise.

Conclusion

In summary, Qi Hua Fan is a prominent inventor whose work in plasma coating systems and ion sources has made significant contributions to materials science. His innovative patents and collaborations reflect his commitment to advancing technology in his field.

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