The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2021
Filed:
Jun. 19, 2019
Board of Trustees of Michigan State University, East Lansing, MI (US);
Fraunhofer Usa, East Lansing, MI (US);
Qi Hua Fan, Okemos, MI (US);
Thomas Schuelke, Pinckney, MI (US);
Lars Haubold, East Lansing, MI (US);
Michael Petzold, Flint, MI (US);
Board of Trustees of Michigan State University, East Lansing, MI (US);
Fraunhofer USA, East Lansing, MI (US);
Abstract
A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.