Michael Petzold

Title: Michael Petzold: Innovator in Plasma Source Technology

Introduction

Michael Petzold is a notable inventor based in Flint, Michigan. He has made significant contributions to the field of plasma technology, particularly with his innovative designs for ion sources. His work has implications for various applications in research and industry.

Latest Patents

Michael Petzold holds a patent for a single beam plasma source. This apparatus is designed to generate ions simultaneously with target sputtering while maintaining the same internal pressure. The patent details various aspects of the ion source, including the use of multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. Additionally, it features a removable cap attached to an anode body that surrounds the magnets, enhancing its functionality.

Career Highlights

Throughout his career, Michael Petzold has worked with esteemed institutions such as Michigan State University and Fraunhofer USA, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas in plasma technology.

Collaborations

Michael has collaborated with notable colleagues, including Qi Hua Fan and Thomas Schuelke. Their combined expertise has contributed to advancements in the field of plasma sources.

Conclusion

Michael Petzold's contributions to plasma technology through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the scientific community and industry applications.