The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2023
Filed:
Jan. 15, 2020
Applicant:
Board of Trustees of Michigan State University, East Lansing, MI (US);
Inventors:
Qi Hua Fan, Okemos, MI (US);
Martin E. Toomajian, Brighton, MI (US);
Assignee:
Board of Trustees of Michigan State University, East Lansing, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/44 (2006.01); C23C 16/509 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32458 (2013.01); C23C 16/4417 (2013.01); C23C 16/509 (2013.01); H01J 37/32669 (2013.01); H01J 2237/18 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01);
Abstract
A rotary plasma reactor system is provided. In another aspect, a plasma reactor is rotatable about a generally horizontal axis within a vacuum chamber. A further aspect employs a plasma reactor, a vacuum chamber, and an elongated electrode internally extending within a central area of the reactor. Yet another aspect employs a plasma reactor for use in activating, etching and/or coating tumbling workpiece material.