This inventor holds 2 USPTO granted patents and 4 published patent applications. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Company Filing History:
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Years Active: 2026
Title: The Innovative Contributions of Putra Saputra
Introduction
Putra Saputra is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. With a total of 2 patents, he has made significant strides in the field of lithography and measurement apparatuses.
Latest Patents
Putra's latest patents include a method for determining a sampling scheme and a semiconductor substrate measurement apparatus. The first patent outlines a method that involves obtaining two fingerprint models related to the spatial distribution of a performance parameter over different portions of a semiconductor substrate. This method aims to determine a sampling point for generating measurement data, focusing on reducing uncertainty metrics associated with the evaluation of these models. The second patent details a method for controlling a lithographic apparatus, which is designed to pattern an exposure field on a substrate. This method includes obtaining an initial spatial profile and decomposing it into component spatial profiles for better control of the lithographic process.
Career Highlights
Putra Saputra is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His work involves innovative approaches to lithography and measurement techniques, contributing to advancements in semiconductor manufacturing.
Collaborations
Putra collaborates with Pieter Gerardus Jacobus Smorenberg, enhancing the innovative capabilities within their projects.
Conclusion
Putra Saputra's work exemplifies the spirit of innovation in the semiconductor field, with his patents reflecting a commitment to improving measurement and lithographic processes. His contributions are vital to the ongoing advancements in technology.