Seoul, South Korea

Pulak Chandra Debnath

This inventor holds 1 USPTO granted patent. Top assignee: Korea Institute of Science and Technology. Active years: 2019.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of Pulak Chandra Debnath in Graphene Synthesis

Introduction

Pulak Chandra Debnath is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of photonics through his innovative methods for synthesizing graphene. His work is particularly relevant in the development of advanced photonic devices.

Latest Patents

Debnath holds a patent titled "Method for Synthesis of Graphene Along Waveguides In Situ, Photonics Device Including Graphene Obtained Using the Method." This patent describes a method for in situ synthesis of graphene along the lengthwise direction of a waveguide. The process involves utilizing an evanescent field of laser propagating in the waveguide to spread outward, depositing a nickel thin film on the waveguide's surface, and growing graphene by irradiating a telecommunication laser to the core of the waveguide. The nickel thin film is then removed, resulting in graphene with high optical nonlinearity synthesized directly within the photonic device. He has 1 patent to his name.

Career Highlights

Debnath is affiliated with the Korea Institute of Science and Technology, where he continues to push the boundaries of research in photonics and materials science. His innovative approach to graphene synthesis has the potential to enhance the performance of various photonic applications.

Collaborations

He has collaborated with notable colleagues, including Yong-Won Song and Md Siam Uddin, who contribute to the research environment at the Korea Institute of Science and Technology.

Conclusion

Pulak Chandra Debnath's work in graphene synthesis represents a significant advancement in photonics technology. His innovative methods and collaborations are paving the way for future developments in this exciting field.

Profile summary based on public USPTO records.
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