Prashanthi Para

Title: Innovations by Prashanthi Para in Semiconductor Processing

Introduction

Prashanthi Para is an accomplished inventor based in Santa Clara, California. She has made significant contributions to the field of semiconductor processing, particularly in the area of controlling deposition defects. Her innovative approaches have the potential to enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Prashanthi Para holds a patent for "Treatments for controlling deposition defects." This patent outlines exemplary methods of semiconductor processing that include forming a plasma of a carbon-containing precursor in a processing region of a semiconductor processing chamber. The methods involve depositing a carbon-containing material on a substrate housed in the processing region. Additionally, the methods detail halting the flow of the carbon-containing precursor into the processing region and contacting the carbon-containing material with plasma effluents of an oxidizing material. This innovative approach aims to form volatile materials from the surface of the carbon-containing material, thereby improving the overall semiconductor processing.

Career Highlights

Prashanthi Para is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work at Applied Materials has allowed her to focus on cutting-edge technologies and contribute to advancements in semiconductor manufacturing processes.

Collaborations

Throughout her career, Prashanthi has collaborated with talented individuals such as Sudha S Rathi and Ganesh Balasubramanian. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Prashanthi Para's contributions to semiconductor processing through her innovative patent demonstrate her expertise and commitment to advancing technology in this critical field. Her work continues to influence the industry and pave the way for future innovations.