Company Filing History:
Years Active: 2013-2014
Title: Innovations by Prasad Narendra Atkar
Introduction
Prasad Narendra Atkar is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and methodologies. With a total of 2 patents, Atkar's work focuses on enhancing the efficiency and accuracy of device manufacturing processes.
Latest Patents
Atkar's latest patents include advancements in mask design and optical proximity correction (OPC) for device manufacture. His work describes a comprehensive approach to mask design and modeling for a set of masks that are successively imaged to print a composite pattern on substrates, such as semiconductor wafers. He has developed methods for double patterning a substrate using these masks, as well as techniques for correcting drawn patterns based on predicted contours of other mask levels. Additionally, Atkar has introduced methods for modeling resist profile contours when photoresist is applied to inhomogeneous substrates, along with predicting resist profiles for Boolean operations involving two masks.
Career Highlights
Prasad Atkar is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work at Intel has positioned him as a key player in the development of advanced manufacturing techniques that are crucial for the production of modern electronic devices.
Collaborations
Atkar has collaborated with talented colleagues such as Shem Ogadhoh and Raguraman Venkatesan. These collaborations have fostered an environment of innovation and have contributed to the successful development of his patented technologies.
Conclusion
Prasad Narendra Atkar's contributions to semiconductor manufacturing through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the industry and pave the way for future advancements in technology.