Company Filing History:
Years Active: 2006-2008
Title: Po-Ying Yeh: Innovator in Semiconductor Technology
Introduction
Po-Ying Yeh is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods to improve the performance of NMOS transistors. With a total of 2 patents to his name, Yeh's work is recognized for its innovative approaches to addressing complex challenges in the industry.
Latest Patents
Yeh's latest patents include a method titled "Narrow width effect improvement with photoresist plug process and STI corner ion implantation." This invention describes a process aimed at reducing the inverse narrow width effect in NMOS transistors. The method involves depositing an oxide liner in a shallow trench formed to isolate active areas in a substrate. A photoresist plug is created in the trench and recessed below the substrate's top to expose the oxide liner. An angled indium implant is then performed through the oxide liner into the substrate. After the plug is removed, an insulator is deposited to fill the trenches. Following planarization and wet etch steps, a gate dielectric layer and a patterned gate layer are formed. This process results in an improved Vt roll-off of 40 to 45 mVolts for both long and short channels, achieved without degrading junction or isolation performance. The flexibility of the process is enhanced by varying the indium implant dose and angle.
Career Highlights
Po-Ying Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and contribute to advancements in semiconductor technology. His work has had a significant impact on the performance and reliability of NMOS transistors, making him a valuable asset to the company and the industry.
Collaborations
Yeh has collaborated with esteemed colleagues such as Yi-Ming Sheu and Da-Wen Lin. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.
Conclusion
Po-Ying Yeh's contributions to semiconductor technology, particularly through his innovative patents, highlight his role as a leading inventor in the industry. His work continues to influence the performance of NMOS transistors, showcasing the importance of innovation in advancing technology.