Po-Wen Teng

Title: Po-Wen Teng: Innovator in Mask Technology

Introduction

Po-Wen Teng is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of mask technology, particularly with his innovative designs that enhance functionality and user experience. His work is recognized for its unique approach to patterned structures in masks.

Latest Patents

Po-Wen Teng holds a patent for a mask that features patterned structures arranged sequentially along a predetermined direction. The design includes a peripheral area surrounding these structures. Each patterned structure consists of an opening portion and a thinning portion that surrounds it. The opening portion is characterized by through holes arranged in a matrix, while the thinning portion has two side edges that are substantially parallel to the predetermined direction. Notably, the thickness of the thinning portion is less than that of the peripheral area, which contributes to the mask's overall effectiveness.

Career Highlights

Po-Wen Teng is currently employed at AU Optronics Corporation, where he continues to innovate and develop new technologies. His work at the company has positioned him as a key player in the advancement of mask technology.

Collaborations

Some of his coworkers include Jui-Hsiang Chen and Hsin-Hung Chen, who contribute to the collaborative environment that fosters innovation at AU Optronics Corporation.

Conclusion

Po-Wen Teng's contributions to mask technology exemplify the spirit of innovation in the field. His patent reflects a thoughtful design that addresses practical needs, showcasing his expertise and commitment to advancing technology.