The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Jan. 29, 2016
AU Optronics Corporation, Hsinchu, TW;
Jui-Hsiang Chen, New Taipei, TW;
Hsin-Hung Chen, New Taipei, TW;
Po-Wen Teng, Taoyuan, TW;
Chun-Chih Lai, New Taipei, TW;
Nan-Huei Jiang, Taoyuan, TW;
Han-Chung Lai, Taoyuan, TW;
Au Optronics Corporation, Hsinchu, TW;
Abstract
A mask including patterned structures arranged sequentially along a predetermined direction and a peripheral area surrounding the patterned structures is provided. Each of the patterned structures includes an opening portion and a thinning portion surrounding the opening portion. The opening portion has through holes arranged in a matrix. An outline of the thinning portion has two side edges opposite to each other substantially parallel to the predetermined direction. The thinning portion is defined by an area demarked by the outline of the thinning portion and an outline of the opening portion. A thickness of the thinning portion is thinner than a thickness of the peripheral area.