Nan-Huei Jiang

Title: Innovations of Nan-Huei Jiang in Mask Technology

Introduction

Nan-Huei Jiang is an accomplished inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of mask technology, particularly with his innovative designs that enhance functionality and usability. His work is recognized for its unique approach to patterned structures in masks.

Latest Patents

Nan-Huei Jiang holds a patent for a mask that features patterned structures arranged sequentially along a predetermined direction. The design includes a peripheral area surrounding these patterned structures. Each patterned structure consists of an opening portion and a thinning portion that surrounds the opening. The opening portion is characterized by through holes arranged in a matrix, while the thinning portion has two side edges that are substantially parallel to the predetermined direction. Notably, the thickness of the thinning portion is less than that of the peripheral area, which contributes to the mask's overall effectiveness.

Career Highlights

Jiang is currently employed at AU Optronics Corporation, a leading company in the display technology sector. His role at the company allows him to apply his inventive skills to develop advanced products that meet market demands. His patent reflects his commitment to innovation and improvement in mask design.

Collaborations

Nan-Huei Jiang has collaborated with notable coworkers, including Jui-Hsiang Chen and Hsin-Hung Chen. These collaborations have likely contributed to the development of his innovative ideas and patents.

Conclusion

Nan-Huei Jiang's contributions to mask technology exemplify the spirit of innovation in the field. His patent showcases a unique design that enhances the functionality of masks, reflecting his dedication to advancing technology.