Taipei, Taiwan

Jui-Hsiang Chen

This inventor holds 1 USPTO granted patent. Top assignee: Au Optronics Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jui-Hsiang Chen. Retrieved from https://idiyas.com/inventor/jui-hsiang-chen-o9ystl2k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations of Jui-Hsiang Chen in Mask Technology

Introduction

Jui-Hsiang Chen is an accomplished inventor based in New Taipei, Taiwan. He has made significant contributions to the field of mask technology, showcasing his innovative spirit through his patent.

Latest Patents

Jui-Hsiang Chen holds a patent for a unique mask design. This mask features patterned structures arranged sequentially along a predetermined direction, surrounded by a peripheral area. Each patterned structure includes an opening portion and a thinning portion that encircles the opening. The opening portion is designed with through holes arranged in a matrix, enhancing its functionality. The thinning portion is defined by its outline and is thinner than the surrounding peripheral area, providing a distinct advantage in design and usability.

Career Highlights

Jui-Hsiang Chen is associated with Au Optronics Corporation, where he has been able to apply his innovative ideas in practical applications. His work has contributed to advancements in mask technology, reflecting his dedication to improving product design and functionality.

Collaborations

Jui-Hsiang Chen collaborates with talented individuals such as Hsin-Hung Chen and Po-Wen Teng, who contribute to the innovative environment at Au Optronics Corporation.

Conclusion

Jui-Hsiang Chen's contributions to mask technology through his patent demonstrate his innovative capabilities and commitment to advancing the field. His work continues to inspire and influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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