Chia-I, Taiwan

Po-Wen Lin


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovations of Po-Wen Lin in Microelectronics

Introduction

Po-Wen Lin is a prominent inventor based in Chia-I, Taiwan, recognized for his innovative contributions to the field of microelectronics. With a focus on enhancing the durability and functionality of microelectronic products, Lin holds a patent that addresses significant challenges in the industry.

Latest Patents

Lin's notable patent, titled "Method for fabricating microelectronic product with attenuated bond pad corrosion," outlines a novel technique for improving the reliability of microelectronic products. This method involves forming a planarizing layer upon a bond pad in conjunction with a topographic feature over a substrate. The unique approach allows for a diminished thickness of the planarizing layer on the bond pad, facilitating easier etching to expose the pad while protecting it during the process. This innovation is particularly beneficial for color filter sensor image array optoelectronic products, as it minimizes bond pad corrosion.

Career Highlights

Po-Wen Lin is currently associated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), one of the leading semiconductor manufacturers globally. His work is instrumental in advancing manufacturing techniques and setting industry standards for microelectronic products.

Collaborations

Throughout his career, Lin has collaborated with talented professionals in his field, including coworkers Chih-Kung Chang and Yu-Kung Hsiao. These collaborations underscore the importance of teamwork and shared expertise in driving technological advancements in the industry.

Conclusion

Po-Wen Lin's contributions to microelectronics through his patented methods highlight the need for continuous innovation in technology. As industries move towards more complex and sensitive electronic products, Lin's work offers essential solutions to improve product integrity and performance. His efforts, alongside those of his colleagues, continue to shape the future of microelectronics in a rapidly evolving landscape.

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