Po-Ting Huang

Title: Po-Ting Huang: Innovator in Semiconductor Technology

Introduction

Po-Ting Huang is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work is essential in advancing the efficiency and effectiveness of semiconductor device structures.

Latest Patents

Po-Ting Huang holds a patent for a "Polishing process for forming semiconductor device structure." This method involves providing a wafer over a polishing platen, where the wafer consists of a metal layer and a dielectric layer. The metal layer covers the dielectric layer and fills an opening of the dielectric layer. The process includes polishing the wafer using a first operation to thin down the metal layer, which has a specific polishing selectivity of the metal layer to the dielectric layer. A second operation further thins down the metal layer until the dielectric layer is exposed, with a different polishing selectivity. Both operations are performed in-situ on the polishing platen, showcasing an innovative approach to semiconductor manufacturing.

Career Highlights

Po-Ting Huang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies that are vital for modern electronics.

Collaborations

Throughout his career, Po-Ting Huang has collaborated with esteemed colleagues such as Shih-Ho Lin and Jen-Chieh Lai. These collaborations have fostered an environment of innovation and have led to advancements in semiconductor processes.

Conclusion

Po-Ting Huang's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the field. His innovative polishing process is a testament to his expertise and dedication to advancing semiconductor manufacturing techniques.