Nantou, Taiwan

Po Shen Chang

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Macronix International Co., Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Po Shen Chang. Retrieved from https://idiyas.com/inventor/po-shen-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1999

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Po Shen Chang: Innovator in Integrated Circuit Technology

Introduction

Po Shen Chang is a prominent inventor based in Nantou, Taiwan. He has made significant contributions to the field of integrated circuits, showcasing his expertise through his innovative patent.

Latest Patents

Chang holds a patent for an "Integrated circuit passivation process and structure." This invention represents a crucial advancement in the technology of integrated circuits, enhancing their performance and reliability.

Career Highlights

He is currently employed at Macronix International Co., Ltd., a leading company in the semiconductor industry. His work at Macronix has allowed him to further develop his skills and contribute to cutting-edge technology.

Collaborations

Throughout his career, Chang has collaborated with notable colleagues, including Been Yih Jin and Daniel L Yen. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Po Shen Chang is a dedicated inventor whose work in integrated circuit technology continues to impact the industry positively. His contributions and collaborations highlight the importance of innovation in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…