Po Nan Chen

Title: Po Nan Chen: Innovator in Overlay Offset Measurement

Introduction

Po Nan Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of overlay offset measurement, holding a total of 2 patents. His work is instrumental in advancing technologies that require precise measurements in various applications.

Latest Patents

Chen's latest patents focus on a process and structure of overlay offset measurement. This innovative process includes several steps: providing a substrate, forming a first pattern layer with a predetermined first pattern on the substrate, and creating a first photoresist layer on both the substrate and the first pattern layer. Additionally, a second photoresist layer is formed on the first photoresist layer, followed by the formation of a second pattern layer with a predetermined second pattern on the second photoresist layer. The process further involves patterning the second photoresist layer to create a trench that aligns with the predetermined first pattern of the first pattern layer. Finally, overlay offset measurement is performed according to the second pattern layer and the trench.

Career Highlights

Po Nan Chen is currently employed at Himax Technologies, Inc., where he continues to develop and refine his innovative techniques. His expertise in overlay offset measurement has positioned him as a valuable asset in the field of technology.

Collaborations

Chen has collaborated with talented coworkers, including Ya-Jing Yang and Yu-Jui Hsieh. Their combined efforts contribute to the advancement of their projects and the overall success of their initiatives.

Conclusion

Po Nan Chen is a distinguished inventor whose work in overlay offset measurement has made a significant impact in the technology sector. His patents and career at Himax Technologies, Inc. highlight his dedication to innovation and excellence.