Taoyuan, Taiwan

Po-Chun Lai


Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2023

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8 patents (USPTO):Explore Patents

Title: Po-Chun Lai: Innovator in Semiconductor Technology

Introduction

Po-Chun Lai is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of eight patents. His work focuses on developing advanced semiconductor devices that enhance performance and efficiency.

Latest Patents

Among his latest patents is a high voltage semiconductor device. This device includes a semiconductor substrate, a gate structure, a drift region, a drain region, and an isolation structure. The gate structure is positioned on the semiconductor substrate, while the drift region is partially located at the side of the gate structure. The drain region is situated within the drift region, and the isolation structure is at least partially embedded in the drift region, featuring a curved bottom surface. Another notable patent is for a semiconductor device that comprises a semiconductor substrate, a gate structure, a source region, a drain region, and multiple field plates. The source and drain regions are located on opposite sides of the gate structure, with field plates positioned above the gate structure and between it and the drain region.

Career Highlights

Po-Chun Lai is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His innovative work has positioned him as a key figure in the development of cutting-edge semiconductor technologies.

Collaborations

He has collaborated with notable coworkers, including Chen-An Kuo and Yi-Chieh Wang, contributing to various projects that advance semiconductor research and development.

Conclusion

Po-Chun Lai's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.

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