Pingsheng Sun

Title: **Pingsheng Sun: Innovator in Plasma Etching Technologies**

Introduction

Pingsheng Sun, a dedicated inventor based in San Jose, California, has made significant contributions to the field of plasma etching technologies. With a focus on improving chemical vapor processes, he has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Pingsheng Sun holds one notable patent: Biased plasma etch processes incorporating Hetch chemistries. This patent particularly addresses high-density plasma chemical vapor etch-enhanced (deposition-etch-deposition) gap fill processes. His invention utilizes hydrogen as an etchant, effectively filling high aspect ratio gaps while minimizing or eliminating dielectric contamination from etchant chemical species.

Career Highlights

Currently, Pingsheng Sun is associated with Novellus Systems Incorporated, a company recognized for its advanced manufacturing equipment and processes in the semiconductor industry. His work at Novellus Systems aligns with his passion for pushing the boundaries of current technologies and improving production capabilities.

Collaborations

Throughout his career, Pingsheng Sun has collaborated with respected colleagues in the field, including Wenxian Zhu and Jengyi Yu. Their collective expertise contributes to the innovative environment at Novellus and the advancement of semiconductor fabrication technologies.

Conclusion

Pingsheng Sun's dedication to innovation in plasma etching processes is evident through his patent and collaborative endeavors. As he continues to work at Novellus Systems Incorporated, his contributions are poised to play a crucial role in the future of semiconductor manufacturing, paving the way for more efficient and effective production methods.