Taipei, Taiwan

Ping-Shen Chou

This inventor holds 1 USPTO granted patent. Top assignee: National Taiwan University of Science and Technology. Active years: 2015.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Innovations by Ping-Shen Chou

Introduction

Ping-Shen Chou is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of polishing slurry technology. His innovative approach has led to the development of a unique system that enhances the quality of substrate processing.

Latest Patents

One of Ping-Shen Chou's key patents is titled "Supplying system of adding gas into polishing slurry and method thereof." This patent describes a supplying system that includes a slurry container, a gas-mixed container, an adjusting device, a first flow controller, and a second flow controller. The system is designed to mix polishing slurry with gas, resulting in a gas-mixed polishing slurry. This innovation is capable of increasing the material removal rate of the substrate's surface, thereby improving the overall processing quality.

Career Highlights

Ping-Shen Chou is affiliated with the National Taiwan University of Science and Technology. His work at this institution has allowed him to explore and develop advanced technologies in the field of materials processing. His dedication to research and innovation has positioned him as a valuable contributor to the academic and industrial communities.

Collaborations

Ping-Shen Chou has collaborated with several esteemed colleagues, including Chao-Chang Chen and Wei-Kang Tu. These collaborations have fostered a productive environment for innovation and have led to further advancements in their respective fields.

Conclusion

Ping-Shen Chou's contributions to the field of polishing slurry technology exemplify the impact of innovative thinking in enhancing processing quality. His patent and ongoing research continue to influence the industry positively.

Profile summary based on public USPTO records.
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