The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Apr. 13, 2014
Applicant:
National Taiwan University of Science and Technology, Taipei, TW;
Inventors:
Assignee:
NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 57/00 (2006.01); B24B 37/34 (2012.01);
U.S. Cl.
CPC ...
B24B 57/00 (2013.01); B24B 37/34 (2013.01);
Abstract
A supplying system of adding gas into the polishing slurry and method thereof are described. The supplying system includes a slurry container, a gas-mixed container, an adjusting device, a first flow controller, and a second flow controller. The supplying system utilizes the adjusting device to mix the polishing slurry with gas for forming the gas-mixed polishing slurry. The supplying system of adding the gas into the polishing slurry and method thereof are capable of increasing the material removal rate of the surface of the substrate in order to improve the processing quality of the substrate.