Ping-Hao Lin

Title: Innovations of Ping-Hao Lin

Introduction

Ping-Hao Lin is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Lin continues to push the boundaries of what is possible in his area of expertise.

Latest Patents

One of Lin's latest patents is a heterostructure device. This device includes a channel layer, a barrier layer disposed on the channel layer, and a first electrode and a second electrode disposed on the barrier layer. The second electrode features a p-type semiconductor structure and a raised section, which includes both a Schottky contact and an ohmic contact. The Schottky contact is formed between the top surface of the p-type semiconductor structure and the first bottom surface of the raised section, while the ohmic contact is established between the second bottom surface of the raised section and the barrier layer.

Another significant patent is the heterostructure field-effect transistor (HFET). This invention comprises a channel layer, a barrier layer, and gate, source, and drain electrodes. The drain electrode includes a p-type semiconductor patterned structure and a raised drain section, which also features Schottky and ohmic contacts. The design ensures that the raised drain section partially surrounds the p-type semiconductor patterned structure, with the bandgap of the channel layer being less than that of the barrier layer.

Career Highlights

Ping-Hao Lin is currently employed at Epistar Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the company's research and development efforts.

Collaborations

Lin collaborates with various professionals in his field, including his coworker Ya-Yu Yang. Their combined efforts contribute to the innovative projects at Epistar Corporation.

Conclusion

Ping-Hao Lin is a prominent inventor whose work in semiconductor technology has led to significant advancements. His patents reflect his commitment to innovation and excellence in his field.