Ping-Chung Lee

Title: Innovations of Ping-Chung Lee in Plasma Etching Technology

Introduction

Ping-Chung Lee is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in plasma etching technology. His innovative designs have the potential to enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

One of his key patents is titled "Plasma etcher edge ring with a chamfer geometry and impedance design." This invention features an edge ring for a plasma etcher that includes a circular bottom portion with an opening designed to receive an electrostatic chuck supporting a semiconductor device. The design incorporates a circular top portion that is integrally connected to the bottom portion. Additionally, the edge ring includes a circular chamfer portion that is integrally connected to both the bottom and top portions. The chamfer portion is designed with an inner surface that angles radially outward from the opening at less than ninety degrees. This innovative design aims to improve the performance of plasma etching processes.

Career Highlights

Ping-Chung Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company allows him to collaborate with other talented professionals and contribute to cutting-edge technology in semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Shih-Ping Hong and Shih-Hao Chen. Their collaborative efforts in the field of semiconductor technology have further advanced the innovations being developed at their company.

Conclusion

Ping-Chung Lee's contributions to plasma etching technology exemplify the importance of innovation in the semiconductor industry. His patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key inventor in this field.