Company Filing History:
Years Active: 2017-2022
Title: **Innovative Insights: The Achievements of Pin-Hen Lin**
Introduction
Pin-Hen Lin, an accomplished inventor based in New Taipei, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of four patents, Lin is recognized for his innovative approaches to semiconductor devices and their manufacturing methods.
Latest Patents
Among Lin's most recent inventions is a patent for a semiconductor device that features a sophisticated gate stack over a semiconductor substrate. This device uniquely incorporates a spacer that extends along the first sidewall of the gate stack, complemented by an epitaxy structure embedded within the substrate. A notable aspect of this invention is the design of a liner that wraps around the epitaxy structure. The liner exhibits a distinctive outer surface that is in contact with the semiconductor substrate, while its inner surface faces the epitaxy structure. The configuration includes facets that form a corner, demonstrating Lin's attention to detail and functional design. His work also emphasizes the importance of curved corners within the structure, contributing to the overall efficiency of the semiconductor device.
Career Highlights
Lin is employed at Taiwan Semiconductor Manufacturing Company Ltd., a leader in the semiconductor industry known for its innovative technologies. His role within the company allows him to direct and develop cutting-edge solutions that push the boundaries of semiconductor capabilities.
Collaborations
Throughout his career, Lin has collaborated with talented professionals such as Chih-Fen Chen and Chui-Ya Peng. These collaborations have been instrumental in driving innovation and ensuring the success of complex projects within the company.
Conclusion
Pin-Hen Lin exemplifies the spirit of innovation in semiconductor technology. His patents not only showcase his inventive prowess but also highlight the collaborative nature of technological advancements. As he continues to contribute to the field, Lin's work is likely to inspire future generations of inventors and innovators.