This inventor holds 1 USPTO granted patent. Top assignee: Advanced Micro Devices Corporation. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: The Innovative Contributions of Pin Chin Connie Wang
Introduction
Pin Chin Connie Wang is a notable inventor based in Menlo Park, California. He has made significant contributions to the field of semiconductor technology. His work focuses on preventing copper contamination in low-k dielectric layers, which is crucial for the performance and reliability of semiconductor devices.
Latest Patents
Wang holds a patent titled "Use of ta/tan for preventing copper contamination of low-k dielectric layers." This patent describes a semiconductor device that includes a first metallization level, a first diffusion barrier layer, a first etch stop layer, a dielectric layer, and an opening extending through these layers. The design ensures that the first diffusion barrier layer is positioned over the first metallization level, while the first etch stop layer is placed over the first diffusion barrier layer. The dielectric layer is then situated above the first etch stop layer. The patent also details the formation of a sidewall diffusion barrier layer and the materials used for the various layers, including tantalum, titanium, and tungsten nitride. This innovation is essential for enhancing the manufacturing process of semiconductor devices.
Career Highlights
Wang is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work at AMD has allowed him to contribute to cutting-edge technologies that drive advancements in electronics. With a total of 1 patent, his innovative approach has garnered attention in the field.
Collaborations
Wang has collaborated with notable colleagues, including Lu You and Christy M-c Woo. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Pin Chin Connie Wang's contributions to semiconductor technology exemplify the importance of innovation in the industry. His patent on preventing copper contamination is a testament to his expertise and dedication to advancing technology. Wang's work continues to influence the development of reliable semiconductor devices.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
