Pilkwang Kim

Title: Pilkwang Kim - Innovator in Semiconductor Technology

Introduction

Pilkwang Kim is an inventor based in Suwon-si, South Korea. He is known for his contributions to the field of semiconductor technology. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

1. **Integrated Circuit Device Including a Field-Effect Transistor** - This application describes an integrated circuit device that features a fin-type active region on a substrate. It includes a nanosheet disposed on the fin-type active region, with a gate line surrounding the nanosheet. The design also incorporates a source/drain region that contacts the nanosheet and an interface insulating film that surrounds the gate line. The inner spacer portion of the film is designed to enhance the device's performance.

2. **Semiconductor Device** - This application outlines a semiconductor device that consists of a substrate with an active pattern and a channel pattern. The channel pattern includes multiple vertically stacked semiconductor patterns. The device features a source/drain pattern connected to these semiconductor patterns, along with a gate electrode and a backbone structure. An air gap pattern is interposed between the backbone structure and each semiconductor pattern, which is crucial for the device's functionality.

Conclusion

Pilkwang Kim is an emerging inventor in the semiconductor field, with innovative patent applications that showcase his expertise. His work has the potential to contribute significantly to advancements in integrated circuit and semiconductor technologies.