Zottegem, Belgium

Pieter Lenssens

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2024

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2 patents (USPTO):Explore Patents

Title: Pieter Lenssens: Innovator in Relief Exposure Technology

Introduction

Pieter Lenssens is a notable inventor based in Zottegem, Belgium. He has made significant contributions to the field of exposure technology, particularly in the development of apparatuses for relief precursors. With a total of 2 patents to his name, Lenssens continues to push the boundaries of innovation in his area of expertise.

Latest Patents

Lenssens' latest patents include an "Apparatus and method for exposure of relief precursors." This apparatus features a substrate layer and at least one photosensitive layer. It is equipped with a first light source that illuminates one side of the relief precursor, while a movable second light source illuminates the opposite side. Additionally, a movable shield captures light transmitted through the relief precursor, and a moving means allows for simultaneous movement of the shield and second light source. Another patent focuses on an apparatus that includes a carrying structure for the relief precursor and an LED array designed to illuminate a photosensitive layer. This LED array can illuminate a surface area of at least 900 cm and consists of multiple subsets of LEDs that are individually controllable, ensuring precise control over irradiation intensity.

Career Highlights

Throughout his career, Pieter Lenssens has worked with several companies, including XSYS Prepress NV and Xeikon Prepress NV. His experience in these organizations has contributed to his expertise in the field of prepress technology and innovation.

Collaborations

Lenssens has collaborated with notable coworkers such as Frederik Defour and Dirk Ludo Julien De Rauw. These partnerships have likely enriched his work and contributed to the advancements in his patents.

Conclusion

Pieter Lenssens stands out as an innovative inventor in the realm of exposure technology for relief precursors. His patents reflect a commitment to enhancing the efficiency and effectiveness of exposure methods. His contributions continue to influence the industry and inspire future innovations.

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