Pierre-Yves Guittet

Title: Pierre-Yves Guittet: Innovator in Semiconductor Technology

Introduction

Pierre-Yves Guittet is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advanced methods and apparatuses for measuring surface profiles and analyzing trench profiles in semiconductor materials.

Latest Patents

One of his latest patents is a method and apparatus for measuring a surface profile of a sample. This invention involves producing an imprint of the surface profile in a transfer material, which is deformable and curable under specific conditions. The transfer material can be thermoplastic or another type that cures through photon irradiation or heating. The imprint is then measured using established methods. Another significant patent is an apparatus for monitoring trench profiles and conducting spectrometrologic analysis. This apparatus utilizes infrared radiation to analyze the substrate, measuring reflectance and phase changes to identify reflective planes within the substrate.

Career Highlights

Throughout his career, Pierre-Yves Guittet has worked with prominent companies in the semiconductor industry, including Infineon Technologies AG and Nan Ya Technology Corporation. His expertise in semiconductor materials and measurement techniques has positioned him as a valuable contributor to the field.

Collaborations

Pierre-Yves has collaborated with notable professionals such as Peter Weidner and Ulrich Mantz, further enhancing his work and contributions to semiconductor technology.

Conclusion

Pierre-Yves Guittet's innovative patents and career achievements reflect his dedication to advancing semiconductor technology. His work continues to influence the industry and pave the way for future innovations.