The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Mar. 31, 2005
Harald Bloess, Dresden, DE;
Uwe Wellhausen, Dresden, DE;
Peter Reinig, Dresden, DE;
Peter Weidner, Rötz, DE;
Pierre-yves Guittet, Dresden, DE;
Ulrich Mantz, Dresden, DE;
Harald Bloess, Dresden, DE;
Uwe Wellhausen, Dresden, DE;
Peter Reinig, Dresden, DE;
Peter Weidner, Rötz, DE;
Pierre-Yves Guittet, Dresden, DE;
Ulrich Mantz, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
In order to measure a surface profile of a sample, an imprint of the surface profile to be examined is produced in a transfer material. The sample contains processed semiconductor material and is in particular a patterned semiconductor wafer or part of a patterned semiconductor wafer. The transfer material is deformable and curable under suitable ambient conditions. The transfer material may be a thermoplastic material or a material which is deformable as desired after application on a substrate and cures in one case by means of irradiation with photons having a suitable wavelength or alternatively heating. The transfer material may be configured in such a way that the imprint produced is the same size as or alternatively of smaller size than the surface profile. The imprint produced is subsequently measured by known methods.