Limoges, France

Pierre Fauchais

This inventor holds 1 USPTO granted patent. Top assignee: L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pierre Fauchais. Retrieved from https://idiyas.com/inventor/pierre-fauchais

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Pierre Fauchais: Innovator in Plasma Technology

Introduction

Pierre Fauchais is a notable inventor based in Limoges, France. He has made significant contributions to the field of plasma technology, particularly in the production of gases for plasma projection of metallic oxides. His innovative work has implications for various industrial applications.

Latest Patents

Fauchais holds a patent for a plasma producing gas that consists of a ternary mixture of helium, argon, and hydrogen. This gas contains at least about 10% hydrogen, typically ranging from 30 to 70% helium, 10 to 50% argon, and 10 to 25% hydrogen, with a preferred concentration of 20% (±5%) hydrogen. This invention is specifically designed for the plasma projection of metallic oxides, showcasing his expertise in the field.

Career Highlights

Pierre Fauchais is associated with L'air Liquide, Société Anonyme Pour L'étude Et L'exploitation Des, where he continues to advance his research and development efforts. His work has been instrumental in enhancing the efficiency and effectiveness of plasma technologies.

Collaborations

Fauchais has collaborated with notable colleagues, including Daniel Nicoud and Jean-Martial Leger. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.

Conclusion

Pierre Fauchais is a distinguished inventor whose work in plasma technology has paved the way for innovative applications in various industries. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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