The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1993
Filed:
Mar. 28, 1991
Applicant:
Inventors:
Daniel Nicoud, Metz, FR;
Jean-Martial Leger, Mery Sur Oise, FR;
Pierre Fauchais, Limoges, FR;
Alain Grimaud, Limoges, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
252372 ; 427453 ; 427452 ; 427455 ; 427456 ;
Abstract
The plasma producing gas consists of a ternary mixture of helium, argon and hydrogen and contains at least about 10% hydrogen, typically 30 to 70% helium, 10 to 50% argon and 10 to 25% hydrogen, preferably 20% (.+-.5%) hydrogen. Use for the plasma projection of metallic oxide.