Phui Fah Chong

Title: Phui Fah Chong: Innovator in Low-k Dielectric Etching

Introduction

Phui Fah Chong is a notable inventor based in Singapore, recognized for her contributions to the field of semiconductor technology. She has developed innovative processes that enhance the efficiency and effectiveness of etching low-k dielectrics, which are crucial in modern electronics.

Latest Patents

Phui Fah Chong holds a patent for a process titled "Selective etching of low-k dielectrics." This invention provides a low-k dielectric etching process with high etching selectivities concerning adjacent layers of other materials, such as an overlying photoresist mask and an underlying barrier/liner layer. The process involves exposing a portion of the low-k dielectric layer to a plasma of a process gas that includes a fluorocarbon gas with a relatively low fluorine to carbon ratio, a nitrogen-containing gas, and an inert gas. The volumetric flow ratio of the nitrogen-containing gas to the fluorocarbon gas is greater than about 20:1. This innovative process allows for improved selectivity to the photoresist mask and the barrier/liner layer, reduced striations, and reduced critical dimension loss compared to conventional low-k dielectric etching processes. Phui Fah Chong has 1 patent to her name.

Career Highlights

Phui Fah Chong is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. Her work focuses on advancing etching technologies that are essential for the production of high-performance electronic devices.

Collaborations

Phui Fah Chong collaborates with Alok Jain, a fellow innovator in the field. Together, they work on developing cutting-edge solutions that push the boundaries of semiconductor manufacturing.

Conclusion

Phui Fah Chong's contributions to the field of low-k dielectric etching exemplify her innovative spirit and dedication to advancing technology. Her work continues to impact the semiconductor industry positively.