This inventor holds 2 USPTO granted patents. Top assignee: Sandia Corporation. Active years: 2010-2012.
Company Filing History:
Years Active: 2010-2012
Title: The Innovations of Phillip F Marsh
Introduction
Phillip F Marsh is a notable inventor based in Lowell, MA (US). He has made significant contributions to the field of infrared technology, particularly through his innovative patents. With a total of 2 patents, Marsh has established himself as a key figure in his area of expertise.
Latest Patents
One of Phillip F Marsh's latest patents is focused on a strained layer superlattice focal plane array (FPA) that features a planar structure. This infrared FPA utilizes a strained-layer superlattice (SLS) composed of alternating layers of InAs and InGaSb, which are epitaxially grown on a GaSb substrate. The design avoids the use of a mesa structure for isolating each photodetector element. Instead, it employs impurity-doped regions around each photodetector for electrical isolation. This innovative approach results in a substantially planar structure where the SLS remains unbroken across the entire width of a 2-D array of photodetector elements. These elements are capped with an epitaxially-grown passivation layer to minimize surface recombination. The FPA is designed for applications within the wavelength range of 3-25 μm.
Career Highlights
Phillip F Marsh is currently employed at Sandia Corporation, where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of infrared detection systems.
Collaborations
Marsh has collaborated with several talented individuals in his field, including Jin K Kim and Malcolm Carroll. Their combined expertise has contributed to the success of various projects and innovations.
Conclusion
Phillip F Marsh's contributions to the field of infrared technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.