La Hulpe, Belgium

Philippe Leray


 

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Terhulpen, BE (2018)
  • La Hulpe, BE (2018 - 2020)

Company Filing History:


Years Active: 2018-2020

Loading Chart...
Loading Chart...
4 patents (USPTO):

Title: The Innovative Contributions of Philippe Leray

Introduction

Philippe Leray is a notable inventor based in La Hulpe, Belgium. He has made significant contributions to the field of lithography, particularly in methods for detecting and verifying defects in lithographic patterns. With a total of 4 patents to his name, Leray's work has had a substantial impact on semiconductor manufacturing processes.

Latest Patents

Leray's latest patents include innovative methods aimed at enhancing the accuracy and reliability of lithographic processes. One of his patents focuses on methods for detecting defects of a lithographic pattern. This method involves acquiring images of regions of interest on semiconductor wafers, removing features that touch the edges of these images, and counting the remaining features to identify defects. Another significant patent pertains to verifying a pattern of features printed by a lithography process. This method includes defining sectors of the reference pattern, determining the contour of the printed pattern, and evaluating parameters related to the surface areas of these sectors against reference values.

Career Highlights

Throughout his career, Philippe Leray has worked with esteemed organizations such as Imec Vzw and Katholieke Universiteit Leuven, also known as KU Leuven R&D. His experience in these institutions has allowed him to collaborate on cutting-edge research and development projects in the field of semiconductor technology.

Collaborations

Leray has collaborated with several professionals in his field, including Sandip Halder and Julien Mailfert. These collaborations have contributed to the advancement of lithographic techniques and the development of innovative solutions for industry challenges.

Conclusion

Philippe Leray's contributions to the field of lithography through his patents and collaborations highlight his role as a key innovator in semiconductor technology. His work continues to influence the industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…