This inventor holds 1 USPTO granted patent. Top assignee: Lsi Logic Corporation. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: The Innovative Contributions of Philip Eric Jackson
Introduction
Philip Eric Jackson is a notable inventor based in Plainsboro, NJ (US). He has made significant contributions to the field of photolithography through his innovative designs and methods. His work has been recognized in the form of patents, showcasing his expertise and creativity in engineering.
Latest Patents
One of Philip Eric Jackson's key patents is titled "Off-axis pupil aperture and method for making the same." This invention discloses a pupil aperture and a method for creating it for use in a photolithography scanner system. The pupil aperture consists of a plate that features a set of pole apertures, which are radially offset from a reference center point of the plate. Additionally, the plate includes a horizontal reference line that intersects the reference center point. This horizontal reference line is crucial for defining a target angle that ranges between about 15 degrees and about 35 degrees from the horizontal reference line. The target angle determines an off-axis location for each of the pole apertures. In a specific aspect of this invention, a set of pole apertures, ranging from 3 to 9, can be defined in the plate, with their offset from the center point selected to be between about 0.3 inches and about 0.9 inches. This patent highlights Jackson's innovative approach to enhancing photolithography technology.
Career Highlights
Philip Eric Jackson is associated with LSI Logic Corporation, where he has contributed to various projects and advancements in technology. His work at the company has allowed him to apply his inventive skills in a practical setting, furthering the development of photolithography systems.
Collaborations
Throughout his career, Jackson has collaborated with talented individuals such as Christopher L. Neville and Mario Garza. These collaborations have likely enriched his work and contributed to the success of his inventions.
Conclusion
Philip Eric Jackson's contributions to the field of photolithography through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile