Clevedon, United Kingdom

Philip Douglas Rossbrook

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Oxford Instruments Plasma Technology Limited. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Philip Douglas Rossbrook. Retrieved from https://idiyas.com/inventor/philip-douglas-rossbrook

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Philip Douglas Rossbrook: Innovator in Plasma Processing Control

Introduction

Philip Douglas Rossbrook is a notable inventor based in Clevedon, GB. He has made significant contributions to the field of plasma processing through his innovative methods. His work focuses on enhancing the control and efficiency of plasma processes, which are crucial in various technological applications.

Latest Patents

Philip holds a patent for a "Method for generating and using a plasma processing control program." This method involves obtaining predetermined process data that defines changes in control parameters during a plasma process. The control data generated from this information is presented graphically to users via an interactive display device. Users can modify the control data in response to their operations, allowing for the generation of a tailored control program.

Career Highlights

Philip is associated with Oxford Instruments Plasma Technology Limited, where he applies his expertise in plasma technology. His innovative approach has led to advancements in the efficiency and effectiveness of plasma processing techniques.

Collaborations

Philip has collaborated with notable colleagues, including Andrew L Goodyear and Andrew Leonard Goodyear. Their combined efforts contribute to the ongoing development and refinement of plasma processing technologies.

Conclusion

Philip Douglas Rossbrook's contributions to plasma processing control exemplify the impact of innovation in technology. His patent and work at Oxford Instruments Plasma Technology Limited highlight his role as a key figure in advancing this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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