Company Filing History:
Years Active: 2008-2014
Title: Phil Freiberger: Innovator in Advanced Mask Patterning Technology
Introduction
Phil Freiberger is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of imaging structures, particularly in advanced mask patterning technologies. With a total of 2 patents, Freiberger's work has had a substantial impact on the semiconductor industry.
Latest Patents
Freiberger's latest patents focus on advanced mask patterning with a patterning layer. The first patent describes an imaging structure, such as a mask or reticle, that may be fabricated using a patterning layer on an imaging layer. This innovative approach allows the patterning layer to have substantially different etch properties than the imaging layer. The first etch process is selective of the patterning layer concerning a resist layer, while the second etch process is selective of the imaging layer with respect to the patterning layer. This dual-process method enhances the precision and efficiency of mask fabrication.
Career Highlights
Phil Freiberger is currently employed at Intel Corporation, where he continues to develop cutting-edge technologies in the semiconductor field. His expertise in advanced mask patterning has positioned him as a key player in the industry, contributing to Intel's reputation for innovation and excellence.
Collaborations
Freiberger has collaborated with talented coworkers such as Jian Ma and Karmen Yung. Their combined efforts have led to advancements in imaging technologies and have fostered a collaborative environment that encourages innovation.
Conclusion
Phil Freiberger's contributions to advanced mask patterning technology exemplify his commitment to innovation in the semiconductor industry. His patents and collaborations reflect a dedication to enhancing imaging structures, making him a significant figure in his field.