This inventor holds 1 USPTO granted patent. Top assignees: Asm Lithography B.v., U.S. Philips Corporation. Active years: 1993.
Company Filing History:
1 out of 29 
1 out of 14,087 
Years Active: 1993
Title: The Innovations of Petrus R Bartray
Introduction
Petrus R Bartray is a notable inventor based in IJsselsteijn, Netherlands. He has made significant contributions to the field of optical lithography, particularly through his innovative designs and patents. His work has been instrumental in advancing technologies that require precise object manipulation.
Latest Patents
One of Bartray's key patents is a support device with a tiltable object table, specifically designed for optical lithographic applications. This support device features a first and a second bearing unit that guide it along a base surface. It includes a straight guide that extends parallel to the base surface. The object table is coupled to a rigidification member and can be displaced in a z-direction, which is transverse to the base surface. It is also tiltable about at least one axis of rotation that runs parallel to the base surface, thanks to three force actuators. The design allows for a statically determined coupling of the rigidification member and the object table to the two bearing units, making it particularly suitable for displacements in the sub-micron range. This innovation enhances the accuracy of focusing objects in optical lithographic devices.
Career Highlights
Throughout his career, Bartray has worked with prominent companies such as U.S. Philips Corporation and ASML Lithography B.V. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the field of lithography.
Collaborations
Bartray has collaborated with notable colleagues, including Jan Van Eijk and Marcel C Baggen. These partnerships have fostered an environment of innovation and have led to advancements in their respective fields.
Conclusion
Petrus R Bartray's contributions to optical lithography through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in technology that require precision and accuracy.