The Hague, Netherlands

Petrus Maria Van Den Berg

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Asml Netherlands B.v.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Petrus Maria Van Den Berg. Retrieved from https://idiyas.com/inventor/petrus-maria-van-den-berg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2021

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Petrus Maria Van Den Berg

Introduction: Petrus Maria Van Den Berg, a talented inventor based in The Hague, Netherlands, has made significant contributions to the field of electromagnetic scattering properties with his groundbreaking patent.

Latest Patents: Petrus Maria Van Den Berg holds a patent for the "Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures." This innovative method involves calculating single-cell contrast current density within a unit-cell supporting domain, calculating scattered electric fields outside the finite collection of unit cells, and determining electromagnetic scattering properties of the structure.

Career Highlights: Petrus Maria Van Den Berg is affiliated with ASML Netherlands B.V., a leading technology company in the Netherlands known for its advancements in the semiconductor industry. His work at ASML showcases his expertise in electromagnetic phenomena and computational methods.

Collaborations: Petrus Maria Van Den Berg collaborates closely with his coworker, Irwan Dani Setija, emphasizing teamwork and shared knowledge in the research and development process. Their collaboration has led to innovative solutions in the field of electromagnetic scattering properties.

Conclusion: Petrus Maria Van Den Berg's inventive spirit and dedication to advancing technology make him a respected figure in the field of electromagnetic scattering properties. His patent exemplifies his ingenuity and commitment to pushing the boundaries of innovation. We look forward to seeing more groundbreaking work from this talented inventor in the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…