Yorktown Heights, NY, United States of America

Peter S Hauge

This inventor holds 3 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1977-1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter S Hauge. Retrieved from https://idiyas.com/inventor/peter-s-hauge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 82(Granted Patents)


Company Filing History:


Years Active: 1977-1988

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3 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Peter S. Hauge

Introduction

Peter S. Hauge is a notable inventor based in Yorktown Heights, New York. With a total of three patents to his name, he has made significant contributions to the field of semiconductor technology. His innovative methods are particularly focused on improving the wirability of complex logic circuits, showcasing his expertise in electronic engineering.

Latest Patents

Among his most recent patents is a "Method for Improving Wirability of Master-Image DCVS Chips". This inventive method aims to enhance the wirability of complementary metal oxide semiconductor (CMOS) differential cascode voltage switch (DCVS) logic circuits. The process involves designing circuitry to maximize the use of diffusion techniques for internal tree connections, thereby permitting more efficient wiring solutions. It employs differential pair and load microblocks designed for mirroring on a vertical center line, which aids in minimizing crossing points within the logic tree.

Another noteworthy patent involves an innovative "Erosion Process for Generation of Offset Masters". These patents underline Hauge's commitment to advancing technology through practical solutions to complex challenges associated with circuit design.

Career Highlights

Peter S. Hauge is affiliated with the International Business Machines Corporation, commonly known as IBM, where he actively engages in research and development. His work at IBM has positioned him at the forefront of advancements in semiconductor technologies, reflecting a career marked by significant contributions to engineering and innovation.

Collaborations

Hauge has collaborated with esteemed colleagues Frederick Hayes Dill and Ellen J. Yoffa, contributing to a productive research environment. These collaborations demonstrate the importance of teamwork in driving technological innovation and problem-solving within complex projects.

Conclusion

Peter S. Hauge's work exemplifies the spirit of innovation that is essential in the fast-evolving field of technology. With multiple patents that show his creative problem-solving capabilities, Hauge serves as an inspiration for future inventors aiming to make a meaningful impact in the world of electronics and beyond. His contributions at IBM continue to shape the landscape of semiconductor technology, making him a key figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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