Peter Renteln

Title: The Innovative Contributions of Peter Renteln

Introduction

Peter Renteln is a notable inventor based in San Ramon, CA (US). He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of 7 patents to his name. His work focuses on optimizing polishing pads, which are essential in various manufacturing processes.

Latest Patents

Among his latest patents is the "Optimized grooving structure for a CMP polishing pad." This invention features a polishing pad with a body that rotates in a predetermined direction. The working surface of the pad is designed with grooves that extend in all directions during a single revolution. This configuration is particularly effective for copper CMP applications. Another notable patent is the "Stacked polyurethane polishing pad and method of producing the same." This invention describes a polishing pad with a sublayer and a top layer, where the sublayer has specific elasticity and compressibility properties, enhancing the pad's performance.

Career Highlights

Peter Renteln has worked with prominent companies in the industry, including Lam Research Corporation and Jh Rhodes Company, Inc. His experience in these organizations has contributed to his expertise in developing innovative polishing solutions.

Collaborations

Throughout his career, Peter has collaborated with talented individuals such as Alan John Jensen and Mario Stella. These partnerships have likely fostered a creative environment that has led to the development of his impactful inventions.

Conclusion

Peter Renteln's contributions to the field of CMP through his innovative patents demonstrate his commitment to advancing technology in manufacturing processes. His work continues to influence the industry and inspire future innovations.